Successful creation of efficient and stable hydrogen evolution reaction and wafer-scale of metallic octahedral 1T-WS2 film growth
Prof. KIM, TAESUNG
Dr. KIM, Hyeong-U
School of Mechanical Engineering/SAINT Prof. Kim, Taesung‧ Dr. Kim, Hyeong-U
Development of New Method for Synthesis of Stable 1T-WS2 using PE-CVD
Prof. Taesung Kim in Mechanical Engineering/SAINT and Dr. Hyeong-U Kim in SAINT have developed the synthesis technique of various 2-dimensional (2D) material using plasma-enhanced chemical vapor deposition (PECVD). A related research paper, ‘Wafer-scale of 1T-WS2 film for efficient and stable hydrogen evolution reaction.’ was published and featured on the back cover of ‘Small’ (IF: 10.85, JCR <10%).
Professor Kim’s group reported the synthesis of large-scale MoS2 which is one of the typical transition metal dichalcogenides (TMDs) using PECVD at low temperature (<150 oC) for the first time in the world (Advanced Materials, 2015). Furthermore, a metal oxide group, α-MoO3 (Nanotechnology, 2017) and MoS2-Graphene heterostructure (Applied Surface Science, 2019) were synthesized for various applications.
As 1T-phase WS2 (1T-WS2) typically has meta-stable structure with metallic properties, which can lead to excellent electrochemical catalytic properties as alternative materials for platinum, Prof. Taesung Kim group and Prof. Jae-Hyun Lee (Ajou University) group worked for the synthesis of stable 1T-WS2 with nano grain size for application of hydrogen evolution reaction (HER). The plasma can generate a nano grain size of 1T-WS2 with high surface energy so it can be stable in atmospheric pressure and room temperature. It was stable with 1,000 cycles and 1 month of exposure in the air for HER.
Professor Kim mentioned that PECVD enables the wafer-scale synthesis of stable 1T-WS2 with high uniformity at low temperature (<150 oC) and this can be one of the critical technologies for future Hydron energy industry.
(Currently, Dr. Hyeong-U Kim continues his research career at Northwestern University under the guidance of Professor Mark C. Hersam working on the synthesis of TMDs using MOCVD for memristor application.)
※ Related Papers
1) Low-Temperature Synthesis of Large-Scale Molybdenum Disulfide Thin Films Directly on a Plastic Substrate Using Plasma-Enhanced Chemical Vapor Deposition (Advanced Materials, 27, 2015, 5223-5229)
(First Author: Dr. Chisung Ahn / Corresponding: Prof. Changgu Lee, Prof. Taesung Kim)
2) Highly uniform wafer-scale synthesis of α-MoO3 by plasma-enhanced chemical vapor deposition (Nanotechnology, 28, 2017, 175601)
(First: Dr. Hyeong-U Kim / Corresponding: Prof. Taesung Kim)
3) Low-temperature wafer-scale growth of MoS2-graphene heterostructures (Applied Surface Science, 470, 2019, 129-134)
(First: Dr. Hyeong-U Kim / Corresponding: Prof. Jae-Hyun Lee, Prof. Taesung Kim)
4) Wafer-Scale and Low-Temperature Growth of 1T-WS2 Film for Efficient and Stable Hydrogen Evolution Reaction (Small, 16, 2020, 1905000)
(First: Dr. Hyeong-U Kim, Vinit Kanade, Mansu Kim / Corresponding: Prof. Jae-Hyun Lee, Prof. Taesung Kim)
○ Prof. Taesung Kim (Corresponding author), Dr. Hyeong-U Kim (1st author)